[labnetwork] Sputtering PTFE

Bob Henderson bob.henderson at etchedintimeinc.com
Thu Aug 10 12:51:45 EDT 2017


Fouad:

 

I agree with Bill Flounders that using C4F8 produces a very uniform Teflon-like film. We produced films in our linear source PECVD system for waterproofing various circuit boards for cell phones and it worked well to a depth of 80 meters in salt water. Bob Henderson

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of A. William (Bill) FLOUNDERS
Sent: Wednesday, August 9, 2017 7:07 PM
To: Fouad Karouta
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Sputtering PTFE

 

Use the C4F8 step only of your pulsed gas (Bosch Process) etcher

Bill Flounders

UC Berkeley



 

On Wed, Aug 9, 2017 at 4:52 PM, Fouad Karouta <fouad.karouta at anu.edu.au> wrote:

Hi all,

 

We have a suer looking to sputter teflon (PTFE), I wonder if there is any facility in the network capable of sputtering PTFE.

 

Thanks, Fouad

 

*************************************

Manager ANFF ACT Node

Australian National Fabrication Facility

Research School of Physics and Engineering

L. Huxley Building (#56), Mills Road, Room 4.02

Australian National University

ACT 0200, Canberra, Australia

Tel: + 61 2 6125 7174 <tel:+61%202%206125%207174> 

Mob: + 61 451 046 412 <tel:+61%20451%20046%20412> 

Email: fouad.karouta at anu.edu.au

http://anff-act.anu.edu.au/

 


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork

 

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20170810/6efeb202/attachment.html>


More information about the labnetwork mailing list