[labnetwork] Sputtering PTFE
Bob Henderson
bob.henderson at etchedintimeinc.com
Thu Aug 10 12:51:45 EDT 2017
Fouad:
I agree with Bill Flounders that using C4F8 produces a very uniform Teflon-like film. We produced films in our linear source PECVD system for waterproofing various circuit boards for cell phones and it worked well to a depth of 80 meters in salt water. Bob Henderson
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of A. William (Bill) FLOUNDERS
Sent: Wednesday, August 9, 2017 7:07 PM
To: Fouad Karouta
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Sputtering PTFE
Use the C4F8 step only of your pulsed gas (Bosch Process) etcher
Bill Flounders
UC Berkeley
On Wed, Aug 9, 2017 at 4:52 PM, Fouad Karouta <fouad.karouta at anu.edu.au> wrote:
Hi all,
We have a suer looking to sputter teflon (PTFE), I wonder if there is any facility in the network capable of sputtering PTFE.
Thanks, Fouad
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