[labnetwork] EBeam Lithography on Glass substrates

[Mark K Mondol]

Aju:

1. Be 100% certain the layer is conductive and connected to ground in 
the tool.

2. Every time they write on glass, do the same exposure on Si, if the 
problem shows up on both Si and glass the issue is not the insulating 
substrate.

3. Al etch can damage PMMA; not always in a repeatable way. Does your 
process include etching the Al (I have found Transene CR-7 chrome etch 
to be compatible with PMMA and ZEP, so usually use Cr not Al as the 
conductive layer).

Regards,

Mark K MOndol

-- 
Mark K Mondol
Assistant Director NanoStructures Laboratory
And
Facility Manager
Scanning Electron Beam Lithography Facility
Bldg 36  Room 229
www.rle.mit.edu/sebl
mondol at mit.edu
office - 617-253-9617
cell - 617-224-8756