[labnetwork] EBeam Lithography on Glass substrates

[Michael Rooks]

We commonly use a 10 nm gold film, sputtered on top of ZEP or PMMA. The 
film can be removed with KI/I solution (Transene TFA etchant) before 
development.

The University of Minnesota has a nice web page about conducting layers 
for ebeam: http://apps.mnc.umn.edu/archive/ebpgwiki/Charging.html


--------------------------------
Michael Rooks
Yale Institute of Nanoscience and Quantum Engineering
nano.yale.edu <http://nano.yale.edu>



On 08/21/2017 12:26 PM, Jugessur, Aju S wrote:
> Hi,
>
> I have a user who is having inconsistent results when exposing 
> patterns (100-200 nm in size) on glass substrate.
> He is using a 5 nm Al layer between the 100nm ZEP and glass substrate. 
> He obtained good results but it does not seem reproducible all the times.
> He is also ensuring that there is good contact between the sample 
> clips and the metal layer. Another approach would be to place the 
> metal on top of the resist.
>
> He has also used the conducting polymer PDOT on ZEP but it does not 
> seem to adhere too well. He could also be doing a step or steps 
> consistently wrong and be unaware.
>
> This is quite a common and established process but I would like to see 
> if the members have any suggestions to ensure reproducible and 
> consistent results for ebeam lithography on glass substrates.
> I will provide more information/details once I receive some feedback.
>
> Thanks,
> Regards
> Aju
>
>
>
>
> /Aju Jugessur, Ph.D.
> Director, University of Iowa Microfabrication Facility (UIMF)
> Optical Science and Technology Center
> Professor Adjunct, Physics and Astronomy
> University of Iowa
> Office: IATL 202, Tel: 319-3532342
> Labs: IATL 170, 172, 174
> https://ostc.uiowa.edu/uimf/
>
>
>
>
>
>
>
>
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