[labnetwork] EBeam Lithography on Glass substrates

[Mark Giulio Chiappa]

Here at NTNU we use electra from Allresist  http://www.allresist.com/ar-pc-5090-5091-electra-92/  It's a cheaper alternative.  Instead of three variants there are two, with one for novolac resists.  This works well and we are able to patter large areas with patterns smaller than 100nm.  If you are unaware the CSAR 62 they mention is an affordable alternative to ZEP.  http://www.allresist.com/wp-content/uploads/sites/2/2016/12/allresist_produktinfos_ar-p6200_englisch.pdf.

Kind regards
Mark

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Rooks
Sent: Monday, August 21, 2017 11:26 PM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] EBeam Lithography on Glass substrates

We commonly use a 10 nm gold film, sputtered on top of ZEP or PMMA. The film can be removed with KI/I solution (Transene TFA etchant) before development.

The University of Minnesota has a nice web page about conducting layers for ebeam: http://apps.mnc.umn.edu/archive/ebpgwiki/Charging.html

--------------------------------
Michael Rooks
Yale Institute of Nanoscience and Quantum Engineering
nano.yale.edu<http://nano.yale.edu>


On 08/21/2017 12:26 PM, Jugessur, Aju S wrote:
Hi,

I have a user who is having inconsistent results when exposing patterns (100-200 nm in size) on glass substrate.
He is using a 5 nm Al layer between the 100nm ZEP and glass substrate. He obtained good results but it does not seem reproducible all the times.
He is also ensuring that there is good contact between the sample clips and the metal layer. Another approach would be to place the metal on top of the resist.

He has also used the conducting polymer PDOT on ZEP but it does not seem to adhere too well. He could also be doing a step or steps consistently wrong and be unaware.

This is quite a common and established process but I would like to see if the members have any suggestions to ensure reproducible and consistent results for ebeam lithography on glass substrates.
I will provide more information/details once I receive some feedback.

Thanks,
Regards
Aju




Aju Jugessur, Ph.D.
Director, University of Iowa Microfabrication Facility (UIMF)
Optical Science and Technology Center
Professor Adjunct, Physics and Astronomy
University of Iowa
Office: IATL 202, Tel: 319-3532342
Labs: IATL 170, 172, 174
https://ostc.uiowa.edu/uimf









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