[labnetwork] Two SEM/EBLs set up in the same room : comments

[Deng, Jiangdong]

Hi, Marylene, 

Nice to know you have a new EBL tool!

Echoing Mark¹s view, it is important to have a field cancellation system
for each EBL/SEM to reducing the EM interference. Our two Elionix systems
share the same room, but each has its own cancelation system (Spicer).

You mentioned that "manufacturer site survey passed², does it include the
floor noise/vibration test? When the Elionix EBL was installed, the
company performed the noise test to ensure the room vibration performance
meets the tool¹s noise spec.. we also occasionally have an outside company
to redo the noise test, especially when we have other big tool
installation nearby.  Please feel free to call in if you need more detailsŠ

-JD



On 12/19/17, 4:41 PM, "labnetwork-bounces at mtl.mit.edu on behalf of Mark K
Mondol" <labnetwork-bounces at mtl.mit.edu on behalf of mondol at mit.edu> wrote:

>I think that you would want to have some sort of Spicer or ADE field
>cancellation system on both systems. Large changes in lens current might
>couple to the SEM.
>
>However I defer to Mike Rooks opinion on this as he actually operated a
>lab with both.
>
>I have an Elionix tool about 10 meters from a Raith (Zeiss Gemini
>column) and they seem to do alright, with the Spicer cancellation
>system. There is also a Zeiss Orion He Ion about another 10 meters away
>and a JEOL 2010 TEM nearby too.
>
>Regards,
>
>Mark K Mondol
>
>
>On 12/19/2017 3:04 PM, Palard, Marylene wrote:
>> Dear Lab Managers
>> E-beam photolithography/ SEM experts,
>>
>> At UT Austin we are lucky to have the task of installing a new EBL/SEM
>>in our NNCI cleanroom lab.
>>
>> The operation team is leaning towards having the new EBL/SEM system in
>>the same room as the 10 years old one.
>>
>> Assuming that
>> - both items are fitting in the room,
>> - the manufacturer site survey passed,
>> - we agreed with jagged edges pictures due to cleanroom flow
>> Could you please share your thoughts on that plan.
>>
>> Sincerely
>> Marylene, an avid reader of the labnetwork messages
>
>-- 
>Mark K Mondol
>Assistant Director NanoStructures Laboratory
>And
>Facility Manager
>Scanning Electron Beam Lithography Facility
>Bldg 36  Room 229
>www.rle.mit.edu/sebl
>mondol at mit.edu
>office - 617-253-9617
>cell - 617-224-8756
>
>
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