[labnetwork] doped Poly Question

[Robert Hower]

Richard,

At the University of Michigan LNF we have 19 furnaces that can handle up to
150mm including P-type insitu doped poly. Our p-type poly is doped with
boron.

We have only characterized insitu p-type for 100mm but have not had a
request for 150mm so it is not characterized. Can you give me some more
information as to what you need? Starting material? Processing done before
this deposition?
I would be happy to send you the data we have for 4" if you are interested.

Rob

On Thu, Jan 26, 2017 at 6:26 AM, Morrison, Richard H., Jr. <
rmorrison at draper.com> wrote:

> Hi Everyone,
>
>
>
> I have the need to deposit In-Situ doped P-Type Polysilicon. Do any of you
> run that process, is so what feed gas is commonly used?
>
>
>
> I understand that In-Situ doped N-Type poly uses P or As mixed with Silane
> in the same cylinder is that correct?
>
>
>
> Do any of you offer P-Type In-Situ doped polysilicon for 150mm wafers?
>
>
>
>
>
> Thanks
>
>
>
> Rick
>
>
>
>
>
> Richard H. Morrison
>
> Principal Member of the Technical Staff
>
> Draper
>
> 555 Technology Square
>
> Cambridge, MA
>
> 02139-3573
>
>
>
> Work  617-258-3420 <(617)%20258-3420>
>
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>
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>
>
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-- 
Robert W. Hower, Ph.D.
The University of Michigan, Lurie Nanofabrication Facility
1301 Beal Ave, 1234A EECS
Ann Arbor, MI 48109
734-827-4370
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