[labnetwork] Long prebakes of PMMA for EBL

[Lino Eugene]

Dear colleagues,

I would like to have inputs from you regarding long prebakes of PMMA before e-beam lithography. I have always used 180 C for 90 s on hotplate as recommended in the technical data from Microchem. However, I have seen some SOPs where the prebake is longer, between 3 min and 20 min. I am wondering if there is any concern about the anisole solvent degassing in the vacuum chamber and if some EBL systems are more sensitive than others.

Also, I am wondering what the impact of a longer prebake has on the EBL process. I would expect a longer development time. What about the dose?

Thank you!

Lino Eugene, Ph.D., Jr. Eng.
Quantum NanoFab
University of Waterloo
200 University Avenue West
Waterloo, ON, Canada
N2L 3G1

Ph: +1 519-888-4567 #37788
Cell: +1 226-929-1685
Website: https://fab.qnc.uwaterloo.ca/

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