[labnetwork] Raith vs. Elionix E-beam writers

[A. William (Bill) FLOUNDERS]

Kevin,
I would encourage including Crestec in this comparison set.
Following Labnet protocol, I will send more specific
vendor and equipment comments 'off line'.

Congratulations! on your NSF award.
Bill Flounders
UC Berkeley

On Tue, Oct 3, 2017 at 4:50 AM, Kevin McPeak <kmcpeak at lsu.edu> wrote:

> Dear Colleagues,
>
> My colleagues at Tulane University and I recently were awarded an NSF
> MRI grant for an E-beam lithography system. We are currently looking
> at two different suppliers for this system, Raith and Elionix. For
> Raith we are looking at their Voyager100 (50 kV) and E-Line Plus (30
> kV) systems and for Elionix we are looking at their latest ELS-S50EX
> (50 kV) model. All three systems have been placed within our budget.
>
> Our group of e-beam writers is interested in achieving both large
> single field sizes of periodic arrays of nanostructures (e.g. ~200 nm
> features over 500 um x 500 um region) and excellent stitching accuracy
> for writing 5 mm x 5 mm arrays of nanostructures.
>
> I would appreciate any input you have on using Raith and Elionix
> systems for high-performance e-beam writing (i.e. custom support,
> usability, uptime, etc.)
>
> Thank you.
>
> Regards,
> Kevin
>
> --
> Kevin M. McPeak
> Assistant Professor
> Louisiana State University
> Dept. of Chemical Engineering
> 110 Chemical Engineering Bldg Room 324
> S. Stadium Drive
> Baton Rouge, LA  70803
> email: kmcpeak at lsu.edu
> phone: 225-578-0058
>
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