[labnetwork] ICP etch of LiNbO3

[Horng, Paul S.]

Hi,
Has anyone had experience with plasma etching of LiNbO3 films ? It is hard to etch so higher platen power is needed to enhance physical sputtering. What is the impact on etch rate of other processes like etching of Si, SiO2, SiN, etc. in the same chamber ?  How often is chamber liner needed to be scrubbed clean ? Will it shorten the life of turbo pump ?

Thank You,

Paul S. Horng, Ph.D
Process Engineer, UD NanoFab
457 ISE Lab
221 Academy Street, Newark, DE 19716
(302)831-4827
http://udnf.udel.edu

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