[labnetwork] Handling of MF-319 Developer

[Aebersold,Julia W.]

At our facility we primarily use MF-319 developer in puddle processing for most of photolithography processes for we do not have a track system.

I am reviewing our PPE for use with this material.  Currently, all clients wear safety glasses and nitrile gloves at our well ventilated developer bench.  I am curious to know if additional PPE is utilized by other facilities and or butyl gloves.

Cheers!

Julia Aebersold
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/

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