[labnetwork] Handling of MF-319 Developer
Noah Clay
nclay at upenn.edu
Mon Oct 29 19:39:23 EDT 2018
Hi Julia,
For MF-319 and similar developers, users at Penn wear nitrile gloves, safety glasses and a face shield.
-Noah
Sent from my iPhone
> On Oct 29, 2018, at 17:34, Aebersold,Julia W. <julia.aebersold at louisville.edu> wrote:
>
> At our facility we primarily use MF-319 developer in puddle processing for most of photolithography processes for we do not have a track system.
>
> I am reviewing our PPE for use with this material. Currently, all clients wear safety glasses and nitrile gloves at our well ventilated developer bench. I am curious to know if additional PPE is utilized by other facilities and or butyl gloves.
>
> Cheers!
>
> Julia Aebersold
> Manager, Micro/Nano Technology Center
> University of Louisville
> Shumaker Research Building, Room 233
> 2210 South Brook Street
> Louisville, KY 40292
> (502) 852-1572
>
> http://louisville.edu/micronano/
>
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