[labnetwork] Handling of MF-319 Developer

Noah Clay nclay at upenn.edu
Mon Oct 29 19:39:23 EDT 2018


Hi Julia,

For MF-319 and similar developers, users at Penn wear nitrile gloves, safety glasses and a face shield.

-Noah

Sent from my iPhone

> On Oct 29, 2018, at 17:34, Aebersold,Julia W. <julia.aebersold at louisville.edu> wrote:
> 
> At our facility we primarily use MF-319 developer in puddle processing for most of photolithography processes for we do not have a track system.
>  
> I am reviewing our PPE for use with this material.  Currently, all clients wear safety glasses and nitrile gloves at our well ventilated developer bench.  I am curious to know if additional PPE is utilized by other facilities and or butyl gloves.
>  
> Cheers!
>  
> Julia Aebersold
> Manager, Micro/Nano Technology Center
> University of Louisville
> Shumaker Research Building, Room 233
> 2210 South Brook Street
> Louisville, KY  40292
> (502) 852-1572
>  
> http://louisville.edu/micronano/
>  
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