[labnetwork] Handling of MF-319 Developer
Lavallee, Guy
gpl107 at psu.edu
Tue Oct 30 08:43:01 EDT 2018
Hi Julia,
At PSU we have our users use the following PPE when working with any wet chemicals (including developers): nitrile gloves, indirect vented safety goggles, chemical apron, and face shield.
Thanks,
Guy Lavalle
Remote Project Manager / Lead Etch Engineer
N-105 MSC Building
Penn State University
University Park, PA 16803
Email: gpl107 at psu.edu<mailto:gpl107 at psu.edu>
Office: 814-865-9339
Cell: 814-777-0719
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Noah Clay
Sent: Monday, October 29, 2018 7:39 PM
To: Aebersold,Julia W. <julia.aebersold at louisville.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Handling of MF-319 Developer
Hi Julia,
For MF-319 and similar developers, users at Penn wear nitrile gloves, safety glasses and a face shield.
-Noah
Sent from my iPhone
On Oct 29, 2018, at 17:34, Aebersold,Julia W. <julia.aebersold at louisville.edu<mailto:julia.aebersold at louisville.edu>> wrote:
At our facility we primarily use MF-319 developer in puddle processing for most of photolithography processes for we do not have a track system.
I am reviewing our PPE for use with this material. Currently, all clients wear safety glasses and nitrile gloves at our well ventilated developer bench. I am curious to know if additional PPE is utilized by other facilities and or butyl gloves.
Cheers!
Julia Aebersold
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY 40292
(502) 852-1572
http://louisville.edu/micronano/<https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Flouisville.edu%2Fmicronano%2F&data=02%7C01%7Cgpl107%40psu.edu%7C71b7639aa34845677f6b08d63e608b92%7C7cf48d453ddb4389a9c1c115526eb52e%7C0%7C0%7C636764981713378120&sdata=6sKg0IxJnyu3tmftv1VtobQ%2FEgra6BRjUdJFKoYY6Ao%3D&reserved=0>
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