[labnetwork] ITO deposition

[Fouad Karouta]

Hi Julian,

We do regularly use ITO in our sputter and we have no particular issues/concerns. We have users who use the target with an RF source and some with a DC source. We've tried originally ITO in an old e-beam evaporator but the layer wasn't conductive while the sputtered layer is conductive.

Regards, Fouad

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 2601, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au
http://anff-act.anu.edu.au/



-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu
Sent: Wednesday, 10 April 2019 2:55 AM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] ITO deposition

Dear Colleagues,

We have received a number of requests to provide ITO deposition capabilities. We have a sputterer but are concerned with the low melting points for Indium and Tin.  I am under the impression that ITO needs a dedicated deposition system. What is your experience/advice?

Thank you,

Iulian

--
iulian Codreanu, Ph.D.
Director of Operations, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163
221 Academy Street
Newark, DE 19716
302-831-2784
http://udnf.udel.edu


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