[labnetwork] ALD process for ZnO?

[Price, Aimee]

Hi Tim,
We have both 110C and 150C processes for ZnO using DeZn and water on our Picosun Sunale ALD tool.  The 150C is our standard and we had to increase the pulse times for the lower temp process, but we did not do a lot of optimization to get a relatively high quality film (at least from an index of refraction perspective).

Feel free to reach out to me personally for the process details.  Our 110C process was kind of a shot in the dark for a customer as part of an Al doped ZnO process, so we have limited data but I do have index of refraction, growth rate, etc.

Generally speaking the tool vendors have great applications people and ZnO is a fairly standard film for them.  If you haven't already, I'd reach out to your tool vendor and ask them their thoughts.  

Best,
Aimee Price

Sr. Research Associate 
The Ohio State University
Nanotech West Lab
Institute for Materials Research
1381 Kinnear Road
Suite 100
Columbus, OH 43212
614-292-2753



-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Tim Gilheart
Sent: Wednesday, August 21, 2019 2:50 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ALD process for ZnO?

Greetings all,

We’re working with some of our users who may need to explore ZnO deposition, ideally at lower temperatures (100 C or less). 

We’re not equipped to do this on any of our PVD systems without inviting other problems, but we understand that several teams on this list have reported accomplishing this via ALD.

If anyone has suggestions, process notes, and/or cautionary tales, we’d appreciate hearing your perspective.

Thanks,

--
Tim Gilheart, Ph.D.
Research Scientist - Nanofabrication Cleanroom Manager, Shared Equipment Authority (SEA), Rice University
Office: 713-348-3159 | gilheart at rice.edu


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