[labnetwork] ALD process for ZnO?

[Brent Gila]

Hello Tim,

Just be aware that methyl byproducts from TMA precursors will decompose 
ZnO on the chamber walls and create dimethylzinc, which will recirculate 
and end up in your films.  After a ZnO ALD run, you should deposit a 
thick layer of something like HfO2 (not Al2O3 from TMA) to seal in the ZnO.

We have had to turn away researchers who wanted to run ZnO in the ALD 
for fear of creating this situation.  We did not want to poison the ALD 
with Zn and effect all the other researchers in the facility.

Best Regards,
Brent

-- 
Brent P. Gila, PhD.
Director, Nanoscale Research Facility
1041 Center Drive
University of Florida
Gainesville, Florida 32611
Tel:352-273-2245
Fax:352-846-2877
email:bgila at ufl.edu



On 8/21/2019 2:49 PM, Tim Gilheart wrote:
> Greetings all,
>
> We’re working with some of our users who may need to explore ZnO deposition, ideally at lower temperatures (100 C or less).
>
> We’re not equipped to do this on any of our PVD systems without inviting other problems, but we understand that several teams on this list have reported accomplishing this via ALD.
>
> If anyone has suggestions, process notes, and/or cautionary tales, we’d appreciate hearing your perspective.
>
> Thanks,
>