[labnetwork] Vanadium Oxide Deposition

[Clark O.D.]

Hi all, recently we have been receiving several requests for Vanadium Oxide deposition via sputtering and ALD. Users are primarily interested in the +4 oxidation state VO2 compound which going on the Sigma Aldrich powder SDS can be handled with typical minor precautions and controls. However V2O5 (which I believe is the more energetically stable and preferred oxidation state upon exposure to atmosphere?) is highly hazardous in dust form regarding it's toxicity, Cat1 for eye damage, and Cat 2 for mutagenicity and reproductive toxicity. So far work with the compound has been declined on the basis of these assessments and because we have no way to measure the amount of material (or its oxidation state) that may or may not be emitted from chambers when they are opened for cleaning.


I would be interested to know if you have allowed vanadium oxide deposition or etching in your facilities (or not), and if you did what controls were enacted to enable safe cleaning of the chambers involved? One idea that has been floated is that Vanadium Pentaflouride is a volatile etch product and perhaps F based plasma cleaning following deposition could help to reduce risk. Although again I am reluctant because the problem of never knowing what particulates lurk in the chamber upon opening is still an issue.


Best regards, Owain
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