[labnetwork] 10M Flatness: Photomasks

[Siva Penmetsa]

Dear All,

We do mask writing on photomask blanks of flatness 5M,7M,
currently due to manufacturing issues the supplier
says he can provide photomasks with 10M flatness only.

Please let us to know if you have any experience writing on 10M flatness
photomask blanks,
with respect to critical dimensions, roughness,any processing issues during
mask(direct) writing and mask aligner(exposure) etc.,
and the trade offs(relative to 5M,7M).

Thanks in advance.

With Regards,
Siva Penmetsa,
Technology Manager,
Lithography and Dry Etch,
National Nano Fabrication Centre(NNfC),
Centre for Nano Science And Engineering(CeNSE),
Indian Institute of Science(IISc), Bangalore, INDIA
<siva at cense.iisc.ernet.in>
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20190521/2b0d69ae/attachment.html>