[labnetwork] ALD availability in the midwest

Martin,Michael David michael.martin at louisville.edu
Mon Aug 10 12:20:30 EDT 2020


Hi Jerry,
   Our Beneq system is up and running at U of Louisville. Currently our precursors are ZnO, Al2O3, and TiO2. If your users need a lot of depositions with another material, we would be happy to consider stocking it.  https://louisville.edu/micronano
Welcome to MNTC — Micro/Nano Technology Center<https://louisville.edu/micronano>
The MNTC is OPEN. A new entry protocol has been implemented for both the cleanroom and the Huson Lab. Contact us before entering either lab, so we may train you on the new protocol.
louisville.edu


Regards,
   Michael
________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Shepard, Jeremiah J <jshepar at purdue.edu>
Sent: Monday, August 10, 2020 9:04 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] ALD availability in the midwest


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All,
Good morning!  I am an engineer with Purdue's Birck Nanotechnology fab.  Our ALD system has went down and will be down for several weeks.  I am looking for alternatives for our researchers to use until our system comes back online.  We are located in West Lafayette, Indiana and options would need to be within a few hours driving distance of our location, or provide the service through mail.

Our system is equipped with AlOx, HfOx,  and SiOx.  The majority of our users are growing AlOx and HfOx.  We have many users interested in low temp growths at 90 to 110 C and we have a limit of 50 nm film thickness.  We also have many users growing at more traditional 200 C temps.  I would expect work coming from our fab to fall within these parameters.

Any leads would be greatly appreciated!

Thank you,
Jerry Shepard

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