[labnetwork] ALD availability in the midwest
Shepard, Jeremiah J
jshepar at purdue.edu
Mon Aug 10 16:48:43 EDT 2020
All,
Thank you very much for your fast replies and support!
To those who have offered to help, I will make your contact information available to our researchers internally and recommend they reach out to you individually with their specific needs.
Thank you again!
Jerry Shepard
________________________________
From: Tony L Olsen <tony.olsen at utah.edu>
Sent: Monday, August 10, 2020 3:49 PM
To: Shepard, Jeremiah J <jshepar at purdue.edu>; labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: RE: ALD availability in the midwest
Jerry
I’m a little further away, but I have a Cambridge Fiji200 with each of these films as standard processes. I’m certainly willing to help.
tonyO
Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT 84112
801-587-0651
www.nanofab.utah.edu
From: Shepard, Jeremiah J <jshepar at purdue.edu>
Sent: Monday, August 10, 2020 07:04
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ALD availability in the midwest
All,
Good morning! I am an engineer with Purdue's Birck Nanotechnology fab. Our ALD system has went down and will be down for several weeks. I am looking for alternatives for our researchers to use until our system comes back online. We are located in West Lafayette, Indiana and options would need to be within a few hours driving distance of our location, or provide the service through mail.
Our system is equipped with AlOx, HfOx, and SiOx. The majority of our users are growing AlOx and HfOx. We have many users interested in low temp growths at 90 to 110 C and we have a limit of 50 nm film thickness. We also have many users growing at more traditional 200 C temps. I would expect work coming from our fab to fall within these parameters.
Any leads would be greatly appreciated!
Thank you,
Jerry Shepard
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