[labnetwork] SiCl4 gas purity for ICP-RIE use

[Peng Yang, Mr]

Dear all,

Our lab just got a new ICP-RIE machine installed. Due to the size limit of our AP3 gas cabinet, our gas supplier only has one option of 99% purity SiCl4. Here is the spec I got from the supplier:
Min 99%
0 - 50 APHA Color
0 - 100 ppm Zr+Ti+Fe+CU+V+Sb+As+Pb

I am wondering if anyone can help to comment if this product is suitable for ICP-RIE etching. What is the spec of your SiCl4 used for ICP-RIE?

Your help is greatly appreciated!



Regards,
Peng


Peng Yang
Research Assistant
McGill Nanotools

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