[labnetwork] ALD venting precautions
Zuzanna A. Lewicka
zlewicka at princeton.edu
Fri Mar 27 17:47:25 EDT 2020
Dear Labnetwork Community,
We are trying to get more information about appropriate venting precautions (e.g. proper exhaust abatement system or just heated ALD trap) for Thermal Atomic Layer Deposition System configured for alumina, hafnia and titania on Si, GaAs, and InP substrates. We would appreciate if you could share your experiences and solutions at your facilities.
Thank you,
Zuzanna Lewicka
Senior Research Specialist
Princeton Institute for the Science and Technology of Materials (PRISM) Cleanroom
Email: zlewicka at princeton.edu<https://owa.princeton.edu/owa/redir.aspx?C=_objl9mq7yUMTgAiqvOi4fXDy7oF3uDvC7guzRPqpQi1k7GZDK_VCA..&URL=mailto%3azlewicka%40princeton.edu>
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