[labnetwork] Low-Stress silicon nitride via LPCVD capability

[Martin,Michael David]

Hi Bill,
   We have a characterized PECVD SiNx recipe that can get close to those stress specifications but we would have to verify the index of refraction. Specifications/data are here: https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf
Stress Measurements and Rates in the Oxford PECVD<https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf>
Stress Measurements and Rates in the Oxford PECVD Daniel Porter and Michael Martin Feb. 13, 2012
louisville.edu
Regards,
   Michael
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Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability


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Hello all,

We have a customer that needs some specific capabilities for low stress Silicon Nitride that we can't provide right now. Does anyone have a well established process that can reach these values. The specs are:

4" wafers
Target thicknesses are 500A and 1500A,
with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05

Please send me your contact info and I will pass it along.
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