[labnetwork] Low-Stress silicon nitride via LPCVD capability

[Xuekun Lu]

Hi Bill,

Is PECVD acceptable? We can do this with our Plasma-Therm SLR PECVD (
https://nano3.calit2.net/equipment/machine.php?eid=93).

Best,
Xuekun


On Fri, Feb 19, 2021 at 8:37 AM Bill Kiether <wjkiethe at ncsu.edu> wrote:

> Hello all,
>
> We have a customer that needs some specific capabilities for low stress
> Silicon Nitride that we can't provide right now. Does anyone have a well
> established process that can reach these values. The specs are:
>
> 4" wafers
> Target thicknesses are 500A and 1500A,
> with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05
>
> Please send me your contact info and I will pass it along.
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