[labnetwork] ISO 5 Cleanroom RH

[Michael Rooks]

Humidity control is mainly for photoresist processing. E-beam resists such
as pmma, csar, and hsq are not sensitive to the humidity and do not require
tight control. Even when using MIBK:IPA developer, there will be no
problems when developing pmma, as long as the wafers are stored in a dry
box. I'm not sure about MaN resist, but perhaps someone else can chime in
about that.

If you can design a cleanroom with humidity control just in the photo
sections, then go for it. But it might be quite difficult to split up the
air handling.

Our e-beam systems are in labs without any humidity control other than
basic air conditioning. Temperature control is an entirely different topic.

--------------------------------
Michael Rooks
nano.yale.edu


On Tue, Oct 12, 2021 at 7:39 AM Aju Jugessur <Aju.Jugessur at colorado.edu>
wrote:

>
>
> Hello all,
>
>
>
> I am reaching out to obtain some inputs on your cleanroom relative
> humidity (RH).
>
> We have designed our ISO 5 cleanroom with RH (40 +/- 5 %). Among other
> cleanroom fabrication processes, the cleanroom will support EBeam
> nanolithography work.
>
> The system to control RH within the required specs is quite expensive and
> I would like to know if anyone in the network is able to relax the RH
> specs, without compromising processes OR have alternative ways of locally
> controlling the RH, say in the actual litho. bay areas or hoods?
>
>
>
> Your inputs are very much appreciated.
>
>
>
> Thanks
>
> Aju
>
>
>
>
>
>
>
>
>
> Aju Jugessur Ph.D. IEEE Sr. Member
>
> Director, Colorado Shared Instrumentation
>
> in Nanofabrication and Characterization (COSINC) Facility
>
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> Science*
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>
> E-mail: aju.jugessur at colorado.edu
>
> Personal Zoom link: https://cuboulder.zoom.us/my/*ajugessur*
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> www.colorado.edu/facility/cosinc
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