[labnetwork] Defects after resist spinning

[Aaron Hryciw]

Hi Eva,

Out of curiosity, did you previously inspect the wafer in an optical
microscope using a higher-mag objective than the one used to capture the
images?  Given how circular these defects look, and the concentric pattern,
my guess is that this is a heating effect, the result of staying too long
in one position with a high light intensity.

Cheers,

 – Aaron



Aaron Hryciw, PhD, PEng

Fabrication Group Manager

University of Alberta - nanoFAB

W1-060 ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 780-940-7938
www.nanofab.ualberta.ca



On Fri, Oct 22, 2021 at 5:55 PM Eva Rose <eva.rose at gno.de> wrote:

> Dear all,
>
>
> did anybody  ever see any defects like this on the resist surface after
> resist spinning. The diameter varies from about 20um to over 150um.
>
>
>
>
>
>
> Any idea what the reason could be?
>
>
> Best regards,
>
> Eva
>
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