[labnetwork] Defects after resist spinning

[Lino Eugene]

Hi Eva,

It looks like that there is dendritic cristallisation in your defects.

Was the subtrate immersed in RCA 1 or BOE or any solution involving a salt? If so, my first thought is that the substrate was not rinsed properly prior spin coating.

Best,
Lino Eugene

On Oct. 23, 2021 07:46, Aaron Hryciw <ahryciw at ualberta.ca> wrote:
Hi Eva,

Out of curiosity, did you previously inspect the wafer in an optical microscope using a higher-mag objective than the one used to capture the images?  Given how circular these defects look, and the concentric pattern, my guess is that this is a heating effect, the result of staying too long in one position with a high light intensity.

Cheers,

 – Aaron



Aaron Hryciw, PhD, PEng

Fabrication Group Manager

University of Alberta - nanoFAB

W1-060 ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 780-940-7938

www.nanofab.ualberta.ca<http://www.nanofab.ualberta.ca/>



On Fri, Oct 22, 2021 at 5:55 PM Eva Rose <eva.rose at gno.de<mailto:eva.rose at gno.de>> wrote:
Dear all,


did anybody  ever see any defects like this on the resist surface after resist spinning. The diameter varies from about 20um to over 150um.

[cid:17caaeab150a3a20b871]

[cid:17caaeab15074e3f89d2]


Any idea what the reason could be?


Best regards,

Eva

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