[labnetwork] Low Temperature (30oC) ICPCVD of SiNx

[James Grant]

Hello,

Had a request from a user (Fengyuan Liu, cc'ed) asking me if I knew of anyone who can deposit SiNx @ 30oC using ICPCVD. Our own OIPT 380 ICPCVD tool is down just now with a SiH4 MFC fault that will probably not be repaired until after Christmas.

Can anyone help? UK based preferred however I've looked at the usual UK suspects and cant find anyone with ICPCVD capability.

Cheers,

James

Dr. James Paul Grant
Research Engineer in Plasma Processing

Plasma Etch Group
james.grant at glasgow.ac.uk<mailto:james.grant at glasgow.ac.uk>

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