[labnetwork] Plasma Etching/Deposition MAEBL Equivalent?

[Albert William (Bill) Flounders]

 Not the same as MAEBL
but AVS short courses may be of interest
https://avs.org/education/short-courses/short-course-schedule/

Bill Flounders
UC Berkeley

On Thu, Jan 20, 2022 at 9:05 AM Owain Clark <odc1n08 at soton.ac.uk> wrote:

> I’d also be interested in such a thing… With perhaps a lean more towards
> the process and fundamental side vs applications
>
>
>
> If you are after further education in etch process I would recommend the
> CEI lectures -
> https://www.cei.se/course-088-plasma-etching-for-cmos-technology-and-ulsi-applications-group.html
> I attended quite a while ago, the material was excellent and a lot of
> theory stretches to far more etch processes than just CMOS and ULSI
> applications.
>
>
>
> O.
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> *On Behalf Of *James
> Grant
> *Sent:* 20 January 2022 07:56
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Plasma Etching/Deposition MAEBL Equivalent?
>
>
>
> *CAUTION:* This e-mail originated outside the University of Southampton.
>
> Hello,
>
>
>
> Been tasked to try and find the most suitable plasma etching/deposition
> workshop/conference/event that is equivalent to MAEBL (https://maebl.org/
> <https://eur03.safelinks.protection.outlook.com/?url=https%3A%2F%2Fmaebl.org%2F&data=04%7C01%7Codc1n08%40soton.ac.uk%7Ca86201a0165347a7c32908d9dc16ace7%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C637782812760740141%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000&sdata=SNXuhW7afLVsoNpYr6SU45cY6dKW%2BloqhkxlWLogy%2FI%3D&reserved=0>
> ).
>
>
>
> Never come across such an event in the plasma etching/deposition domain.
> What I find is that workshops/conferences are more focused on either an
> aspect of plasma etching/deposition (e.g. https://ald2022.avs.org/
> <https://eur03.safelinks.protection.outlook.com/?url=https%3A%2F%2Fald2022.avs.org%2F&data=04%7C01%7Codc1n08%40soton.ac.uk%7Ca86201a0165347a7c32908d9dc16ace7%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C637782812760740141%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000&sdata=o42947insNLgQcC3kKbVJvtPRaOVnP%2F%2FNyqHarVTJqs%3D&reserved=0>)
> or are material/application specific (e.g. https://www.iwn2022.org/
> <https://eur03.safelinks.protection.outlook.com/?url=https%3A%2F%2Fwww.iwn2022.org%2F&data=04%7C01%7Codc1n08%40soton.ac.uk%7Ca86201a0165347a7c32908d9dc16ace7%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C637782812760896345%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000&sdata=%2FzAmQBWQ9cX5pkiVNvPcK5Sguh%2Ftu3728QsL2YzI5qA%3D&reserved=0>
> ).
>
>
>
> Cheers,
>
>
>
> James
>
>
>
> Dr. James Paul Grant
>
> Research Engineer in Plasma Processing
>
>
>
> *Plasma Etch Group*
>
>  james.grant at glasgow.ac.uk
>
>
>
>
>
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