[labnetwork] Puddle development for thick photoresist

[Mo Khodadadi]

Hi,



We are using AZ4620 for 5 to 80 um thick patterns.

Currently, we are developing the beaker.

Anyone has experience with developing thick photoresist by puddle
development system.

What type of development is the best for thick photoresists?

Any recommendation for SUSS Lab spin or Cee developer?



Best regards,

Mo Khodadadi
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