[labnetwork] [EXTERNAL] Treating silane exhaust from PECVD
Aebersold, Julia Weyer
julia.aebersold at louisville.edu
Fri Jan 13 10:41:15 EST 2023
At the University of Louisville we exhaust our PECVD in the same manner as Draper. We have a lot of exhaust flow, too.
Cheers!
Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY 40292
(502) 852-1572
http://louisville.edu/micronano/
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Morrison, Richard H., Jr
Sent: Thursday, January 12, 2023 4:29 PM
To: hadi_esmaeilsabzali at sfu.ca; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD
CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue.
We have a trap on our LPCVD furnace to collect the excess material.
Rick
Richard Morrison
DMTS
Draper Laboratory
555 Technology Square
Cambridge Ma 02139
Office: 617-258-3420
Cell: 508-930-3461
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Hadi Esmaeilsabzali
Sent: Thursday, January 12, 2023 2:35 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD
CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.
Dear Colleagues,
For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems.
We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia).
Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time.
I appreciate it if you share other (cost-effective) suggestions you might have for us!
Thanks,
Hadi
Hadi Esmaeilsabzali, PhD
Nanofabrication Group Manager, 4D LABS
Simon Fraser University
8888 University Dr., Burnaby, B.C. V5A 1S6
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