[labnetwork] [EXTERNAL] Treating silane exhaust from PECVD

[Morrison, Richard H., Jr]

Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue.



We have a trap on our LPCVD furnace to collect the excess material.



Rick



Richard Morrison

DMTS

Draper Laboratory

555 Technology Square

Cambridge Ma  02139

Office: 617-258-3420

Cell: 508-930-3461







From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Hadi Esmaeilsabzali
Sent: Thursday, January 12, 2023 2:35 PM
To: labnetwork at mtl.mit.edu
Subject: [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD



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Dear Colleagues,



For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems.



We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia).



Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time.



I appreciate it if you share other (cost-effective) suggestions you might have for us!



Thanks,

Hadi



Hadi Esmaeilsabzali, PhD

Nanofabrication Group Manager, 4D LABS

Simon Fraser University

8888 University Dr., Burnaby, B.C. V5A 1S6
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