[labnetwork] Sparkles in the PECVD deposited amorphous silicon film

[Vibhor Kumar]

Dear labnetwork community,
We are trying to deposit a-si (~100 nm) with plasmatherm PECVD. We are using 10% silane. Our recipe worked fine in the past. But this time we started looking some "sparkles" in the deposited film (image attached). We cleaned the chamber with freon gas, but still the situation is the same.

Any suggestion/s will be highly appreciated.

Sincerely,
-Vibhor Kumar-
Research Associate,
School of Engineering,
Rutgers, The State University of New Jersey, NJ
USA.
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230724/4d4d6105/attachment.html>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: amorphous silicon.jpg
Type: image/jpeg
Size: 2842221 bytes
Desc: amorphous silicon.jpg
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230724/4d4d6105/attachment.jpg>