[labnetwork] Forming gas: 5% or 10% hydrogen

[Golan Tanami]

Hi Mario,

I don’t know about “the best”, but in our RTA, we use 5% H2 and 95% N2. I think it’s pretty standard.

Anyway, nobody complained yet 😊

Best regards,

Golan.

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Golan A. Tanami, PhD | Head of the Unit for Nanofabrication (UNF)

Center for Nanoscience and Nanotechnology
Edmond J. Safra Campus
The Hebrew University of Jerusalem
T +972.2.6584179 | M +972.50.9891111
golant at savion.huji.ac.il<mailto:golant at savion.huji.ac.il>
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From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Beaudoin, Mario
Sent: Tuesday, February 27, 2024 10:27 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Forming gas: 5% or 10% hydrogen


Dear Network,

We're setting up a new RTA and will run it with Ar, N2 and forming gas.  We're uncertain about the % level of hydrogen we want in our forming gas.  Can someone recomment the best hydrogen % to use for MOS capacitor annealing?

Regards,

Mario
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