[labnetwork] Filtering Setup and Documentation Request for Technics Planar Etch II Plasma Etcher

[Stefan Schoenleitner]

Hello,

we recently acquired an old Plasma Etcher with a 750W 13.56 MHz RF
plasma generator (Technics Planar Etch II, similar to the unit here:
http://www.cleanroom.byu.edu/pe2.phtml).

We are planning to use the unit with CF4 and O2 gas as well as N2 as
vent gas. Our main application would be IC (integrated circuit)
processing such as delayering or pre-processing for SEM analysis.

In order to get the system up and running, it would be helpful to
receive operating and technical manuals for the system.
While we already have the unit's setup and operating manual, we are
wondering if anyone has the following and could send it to us:

        * Schematic, model 750 plasma generator, d-3100-041
        * schematic, planaretch II system, c-3100-038
        * drawing, reference assembly, d-3100-049
        * drawing, p.c. board assembly, c-3100-048

In addition, we would like to know more about usable and practically
safe vacuum and exhaust setups.
We currently have an Alcatel 2012A rotary vane vacuum pump that is not
chemically resistant.
In order to filter out corrosive and/or poisonous gases such as CO, we
would like to use an inlet trap as well as an oil mist and exhaust
filter. After that, the exhaust should be vented to the outside of the
building without further processing.

For the traps/filters, activated aluminia as well as activated charcoal
filter media are available.

Examples:
http://www.pchemlabs.com/subcatagoryb.asp?pid=Replaceable-Element-Traps,-Plastic

Which filter media do you suggest for our application ?

Activated aluminia seems to work well with fluorides and appears to be
widely used for plasma etching systems.
However, at the same time, both filter media do not seem to work well
for filtering CO exhaust gas.

Another questions concerns storage of the inline trap.
If we don't use the devices that need vacuum pumps, we typically turn
them off.
However, for the inlet traps this would mean that water and possibly a
bit of dust could get into the inlet trap and, as a result, the filter
media (i.e. activated aluminia) would get slightly moist.
Is that a problem ?
Should we store the inlet trap in vacuum, for instance by adding vacuum
valves before and after the trap so that we can store it under vacuum
(at least as long as the valves can hold the vacuum) ?


Thank you and best Regards,
Stefan