[labnetwork] Deep Reactive Ion Etch Problems

[Fabien Dauzou]

Hi Pallavi,

10min might be long for the gas to proper evacuate and that's why you will observed self-masking hence black-silicon.

You might need to do some break in your etching recipe to see what happen.

Best regards, Bien cordialement,

Fabien Dauzou
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From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Pallavi Sharma
Sent: July 27, 2020 12:02 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Deep Reactive Ion Etch Problems

Hello all,

I am having problem with anisotropic etching of silicon by Deep Reactive ion etch. Grass or black silicon is the issue all the time, attaching some of the SEM pictures of the sample. Every recipe I tried to fine tune result in grass formation, even as the process initiates in tool wafer surface starts to turn brown and ultimately black. I tried varying SF6 gas flow, Bias power, Substrate temperature but every time I see is highly dense grass with no clean surface.
Any help will be greatly appreciated.

Thank you,
Pallavi

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