[labnetwork] Hotplate options for resist baking

[Aaron Mueller]

Hi All,

Not sure if you're looking for smaller samples/wafers/both, but for wafers,
where we need high uniformity, I really like the the SPS POLOS hotplates
(e.g.
https://www.sps-europe.com/order/polos-hotplate-200s-230vac---single-without-options/15965/),
though it does take a bit long to get to temperature, e.g. 17°C-120°C 45
min, 120°C-140°C 15 min. What I like about how it operates is that you
place the wafer on raised pins, When you start the recipe, they lower, and
when it's finished, they rise. My two cents...

Best Regards,
Aaron

Research Fellow
Nanyang Technological University
School of Materials Science and Engineering
50 Nanyang Ave, N4.1-01-14
Singapore 639798
+65 81217105



On Wed, Jul 7, 2021 at 8:07 AM Morrison, Richard H., Jr <
rmorrison at draper.com> wrote:

> Hi Aimee,
>
>
>
> Here at Draper we use Wensco very good flat accurate hot plates, these are
> our hot plates for resist bake.
>
>
>
> WENESCO INC
>
> 3057 N ROCKWELL STREET
>
> CHICAGO IL 60618
>
> United States
>
>
>
>
>
> Richard Morrison
>
> PMTS
>
> Draper Laboratory
>
> 555 Technology Square
>
> Cambridge Ma  02139
>
> Office: 617-258-3420
>
> Cell: 508-930-3461
>
>
>
>
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Price,
> Aimee
> *Sent:* Tuesday, July 6, 2021 12:41 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Hotplate options for resist baking
>
>
>
> Hello everyone,
>
> We are looking for a  couple standalone hotplates for resist soft and hard
> bakes.  We have one nice, uniform hotplate attached to one of our CEE
> coaters.  However, it takes a long time to change temps and doesn’t get
> used as much as it should.  The lab hotplates we have are ok for general
> lab use and not cheap, but are not uniform or reproducible enough for
> resist baking for sensitive processes (I think that means all processes😊).
>
>
>
>
> I’m sure I’ll be overwhelmed with ideas, so thanks in advance.  What are
> your suggestions for resist bake hotplates with uniformity of at least +/-
> 1 deg F?  I do not necessarily need vacuum or proximity, in fact would
> likely rather not have those options.
>
>
>
> Best,
>
> Aimee
>
>
>
> Sr. Research Associate
>
> The Ohio State University
>
> Nanotech West Lab
>
> Institute for Materials Research
>
> 1381 Kinnear Road
>
> Suite 100
>
> Columbus, OH 43212
>
> 614-292-2753
>
>
> ------------------------------
> Notice: This email and any attachments may contain proprietary (Draper
> non-public) and/or export-controlled information of Draper. If you are not
> the intended recipient of this email, please immediately notify the sender
> by replying to this email and immediately destroy all copies of this email.
> ------------------------------
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20210707/74026854/attachment.html>