[labnetwork] Sparkles in the PECVD deposited amorphous silicon film

Owain Clark odc1n08 at soton.ac.uk
Tue Jul 25 03:00:48 EDT 2023


Looks like compressive stress.

Improve the sample pre-cleaning as suggested or try depositing onto SiO2 and the adhesion should improve.

O.

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Jeremy Clark
Sent: 24 July 2023 23:36
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Sparkles in the PECVD deposited amorphous silicon film

CAUTION: This e-mail originated outside the University of Southampton.

Hi Vibhor,



You should look under a microscope but these look like bubbles- either from poor adhesion or too much Hydrogen in the film (or both).



How did you clean your sample before deposition?

What is the underlying material, and is it possible it has changed?

Is possible that some part of the tool was changed recently?



Regards,

Jeremy Clark

Cornell Nanoscale Facility


On 7/24/23 13:12, Vibhor Kumar wrote:
Dear labnetwork community,
We are trying to deposit a-si (~100 nm) with plasmatherm PECVD. We are using 10% silane. Our recipe worked fine in the past. But this time we started looking some "sparkles" in the deposited film (image attached). We cleaned the chamber with freon gas, but still the situation is the same.

Any suggestion/s will be highly appreciated.

Sincerely,
-Vibhor Kumar-
Research Associate,
School of Engineering,
Rutgers, The State University of New Jersey, NJ
USA.



_______________________________________________

labnetwork mailing list

labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>

https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230725/8a8d3129/attachment.html>


More information about the labnetwork mailing list