[labnetwork] Question regarding amorphous Si deposition

[Zhu Yunxuan]

Hi everyone,

Is there a way to deposit thick amorphous Si on several micrometres
scale(~5um or above) but with a low processing temperature (<150 deg C)?
PECVD is one possibility but the typical operating substrate temperature is
too high (>200 deg C) which will destroy our device.

Best regards,
Longji Cui

University of Colorado Boulder
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